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Author:
Date:
2015-07-20
[Abstract] A wide range of stresses such as oxidative stress, acid, alkaline, UV, and metal can damage DNA. Here, we describe a protocol to measure the DNA nicking damage by Fenton reaction-mediated oxidative stress. Fenton reaction (Fe2+ + H2O2 → Fe3+ + OH- + ∙OH) produces the highly deleterious hydroxyl radicals that damage the cellular components such as DNA, lipid and proteins.
[摘要] 诸如氧化应激，酸，碱，UV和金属的各种应力可以损害DNA。 在这里，我们描述了一个协议，以测量DNA切口损伤芬顿反应介导的氧化应激。 Fenton反应（Fe 2+ + H 2 O 2 O 2→Fe 3+ +）+ OH - +∙OH）产生损害细胞组分如DNA，脂质和蛋白质的高度有害的羟基自由基。
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